This Paper extends from the importance and urgency of promoting the development of IC industry to the key technology of controlling IC yeid-wafers surface environmental contamination control(SECC).Recently,IRDS 2020 clearly put forward the key expound on yield enhancement,pointing out that airborne molecular contamination(AMC) is an important factor causing random defects in wafers,and this effect will become more serious with the decreasing of wafer linewidth.In this paper,the technologyrequirements for surface enviormental contamination control from 2021 to 2027 are listed with according to the allowable control concentration of different air pollutants in each process of production process,it is expressed in ppTV.Because of the strict control standard,it is required that the design of chemical pollution control ventilation system in cleanrooms and associated controlled environments,selection of air chemical filter,setting and performance requirements.It must be carried out strictly according to the standard.In addition,the performance indicators of air chemical filter,test rig of filter and test procedure in ASHRAE standard 145.2-2016 and other contents are introuduced.

Or could we fullfill the cleaning dreams by cleanroom wipers? I think the answer's YES.